Where Do the Particles Go? (And Why That Question Matters More Than You Think)

In manufacturing environments, particles are everywhere — generated during cleaning, assembly, inspection, and handling. Yet one of the most overlooked questions in contamination control is also the most important:

 

Where do the particles actually go?

In many facilities, particles are blown off parts using compressed air or ionized air tools. But instead of being removed from the environment, those particles are simply displaced — settling elsewhere, recirculating in the air, or re-contaminating downstream processes.

 

At C. C. Steven & Associates, Inc., we don’t just ask that question — we have the solution.

 

 

 

 

 

The Hidden Problem with Traditional “Blow-Off” Systems

Most particle control systems fail for one simple reason:
They don’t provide enough face velocity to actually capture particulate.

Without sufficient airflow at the point of generation:

• Particles migrate instead of being removed

• Contamination spreads to nearby work areas

• Static charges attract particles back onto product surfaces

• Rework, defects, and yield loss increase

Many systems claim to capture particles, but without the correct airflow design, they simply move contamination from one place to another.

 

 

Introducing the Particle Capture System (PCS): Muon Trap® and Clean Family Products!

To solve this problem, C. C. Steven & Associates developed the Particle Capture System® Family of products, a U.S.-patented particle capture system designed specifically to capture particles at the source — not after they’ve already spread.

 

Why It Works:

• Up to 4x greater face velocity than any other system in the field

• True source capture, not redistribution

• Closed-loop HEPA filtration

• Optional ionization for static control

• Designed for real-world manufacturing environments

This patented design allows particles to be captured immediately, preventing contamination from migrating through the workspace.

 

 

PCS System Configurations

The PCS Muon Trap® is available in multiple configurations to support a wide range of applications:

• PCS Under Bench Mount®

• PCS Clean Station®

• PCS Clean Table®

• PCS Clean Cube®

• Vertical PCS Muon Trap®

• Custom-engineered configurations

All systems are designed to integrate seamlessly into existing workflows while improving cleanliness, consistency, and process control.

 

 

Why Manufacturers Choose C. C. Steven & Associates

Since 1978, we’ve helped manufacturers solve complex challenges involving:

• Particle contamination

• Static electricity and ESD

• Airflow and filtration

• Process reliability

• Yield improvement

What sets us apart isn’t sales — it’s providing solutions.

 

 

WE ARE THE EXPERTS!

 

We combine:

• U.S.-patented technology

• Over 45 years of application experience

• Hands-on customer education

• Solutions built for real production environments

 

 

Visit Us at MD&M West 2026

📍 Anaheim Convention Center
📅 February 3–5, 2026
📌 Booth #2482

At our booth, you can:

• See live demonstrations of all our Particle Capture System products (bring your parts to clean!)

• Learn how face velocity impacts capture efficiency

• Speak directly with our technical team

• See why “blow-off” isn’t capture

Stop asking where the particles go — come see the solution.

 

 

 

Meet the faces behind C. C. Steven & Associates, Inc.

         

 

 

Can’t wait until next week or can’t attend in person? Watch this quick overview from Dr. Static himself.