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PRODUCTS

The Particle Capture System (PCS) Clean Family of Products

PCS CLEANSTATION/PRO

PCS UNDER BENCH

PCS DUAL DUCT / VERTICAL

PCS CLEAN CUBE

PCS CLEAN TABLE

PCS CUSTOM CONFIGURATIONS

PARTICLE CAPTURE SYSTEMS:

  • C.C. Steven and Associates has been supplying for years an assortment of Ionizing Blow off guns and nozzles. They are a very effective way to minimize static attraction as well as assist in cleaning products prior to critical applications.
  • Often, the questions is asked… WHERE do the particles go?   
  • We now have the answer… AND the Solution! ORDER NOW!
  • Our US Patented/CE/MADE IN USA approved system has up to 4 times greater face velocity versus any existing system on the market.
  • COME SEE DEMO AT MD&M Show in Anaheim on February 6th-8th 2024, Booth 2482!

Introducing the Particle Capture System (PCS): Muon Trap® (US Patent #10,610,817 and CE APPROVED) product line. We will not only blow off particulate from your product, we will capture what is blown off as well. Our first release in this new product line is the Under Bench Mount PCS Muon Trap® (US Patented/CE Approved) AND the Clean Station PCS Trap®  version ALL with closed loop particle capture with Hepa Filter return. We also offer a Dual PCS Muon Trap® with dual intake inlets, and a Vertical PCS Muon Trap®. We have a PCS Platform Assembly with castors available for the Under Bench Mount, Dual and Vertical configurations. The PCS Muon Trap® offerings can be provided with or without ionization.

WHAT SETS US APART?

Our US Patented system design has up to 4 times more face velocity at the capture hood than any other system on the market. The face velocity is the key to capturing particulate. Don’t be fooled by other particle traps or capture systems that claim to work! Without proper face velocity your particles are not being captured, and what is the point of a capturing system if it isn’t trapping the particulate?

Call us today for on-site demo or our Trial Demo Program.

Finally, an innovative, effective, and seamless way to clean your parts prior to your critical process AND CAPTURE THE PARTICLES.